(June 15, 2018) ITRC’s Successful Training Program Brought the Latest Advances to Industry Stakeholders at the Eleventh International Conference on Remediation of Chlorinated and Recalcitrant Compounds, Palm Springs California, April 8-12, 2018
ITRC team leads and members participated in every aspect of the conference contributing greatly to its success. ITRC hosted five of the twelve short courses presented at the conference and was able to train an additional 134 practitioners through these short courses.
The courses offered by ITRC were:
- Managing PFAS Contamination at Your Site - Site Characterization, Sampling, Fate and Transport, along with Remedial Alternatives.
- Using Groundwater Statistics and Geospatial Analysis for Remediation Optimization
- Integrated DNAPL-LNAPL Site Characterization and Tools Selection
- New ITRC Guidance: Remediation Management of Complex Sites
- Characterization and Remediation in Fractured Rock
The Managing PFAS course was the most popular and well attended short course at the conference and was developed and hosted by ITRC to bring the environmental industry together to address one of the most pressing challenges faced today. Some notable comments from short course attendees included: “outstanding course,” “enjoyed the case study discussion,” “good comprehensive overviews of each topic with a good level of detail,” and “very interesting and extensive course.”
In addition to the short courses, ITRC team leads representing 6 active ITRC teams chaired 10 sessions and participated in 3 panels. ITRC hosted a lunch-and-learn event where conference attendees received a comprehensive overview of the organization’s mission. ITRC also hosted a booth where team leads could liaise with conference attendees on a one-on-one basis throughout the duration of the conference. The Battelle conference chairs and organizers truly appreciate the participation of ITRC in the 2018 Chlorinated Conference and look forward to working together to enhance collaboration in the environmental remediation field.